发明名称 SUPPORT SUBSTRATE OF WAFER AND PROCESSING METHOD OF WAFER
摘要 <P>PROBLEM TO BE SOLVED: To easily cut a chamfered part of a wafer without causing damage to a surface of a support substrate supporting the wafer. <P>SOLUTION: In a support substrate 1 to which a circular wafer W is attached through a bond agent, a ring shaped clearance groove 2 is formed on a surface 1a. Thus, when a surface Wa of the wafer W is attached to the surface 1a of the support substrate 1 and a chamfered part 4 formed at an outer periphery of the wafer W is removed, a cutting blade 60 enters into the clearance groove 2 and thus the cutting blade 60 avoids contacting with the support substrate 1. This structure allows the cutting blade 60 to easily cut the chamfered part 4 of the wafer W without causing damage to the surface 1a of the support substrate 1. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013102080(A) 申请公布日期 2013.05.23
申请号 JP20110245480 申请日期 2011.11.09
申请人 DISCO ABRASIVE SYST LTD 发明人 KOBAYASHI YOSHIKAZU
分类号 H01L21/683;H01L21/304 主分类号 H01L21/683
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