发明名称 |
MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
摘要 |
A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.
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申请公布号 |
US2013128252(A1) |
申请公布日期 |
2013.05.23 |
申请号 |
US201313747142 |
申请日期 |
2013.01.22 |
申请人 |
CARL ZEISS SMT GMBH;CARL ZEISS SMT GMBH |
发明人 |
RASSEL THORSTEN;HAUF MARKUS |
分类号 |
G03F7/20;G02B5/09 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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