| 摘要 |
<P>PROBLEM TO BE SOLVED: To continuously deposit a plurality of films of high quality on a substrate. <P>SOLUTION: Each of a plurality of film deposition chambers 100 includes a casing 150, and a spray nozzle 130 for spraying microparticulated mist of a film deposition material 160 in the casing 150. The casing 150 has an exhaust port 152 which is located in one side wall and connected to an exhaust means, and open parts opposite to the substrate 200 and successively passing through the plurality of film deposition chambers 100 in a heating furnace 120. The mist passes through the open parts from the spray nozzle 130 in each of the plurality of film deposition chambers 100, and flows toward the exhaust port 152. The exhaust flow rate from the exhaust port 152 by the exhaust means is larger than the inlet flow rate into the casing 150. <P>COPYRIGHT: (C)2013,JPO&INPIT |
