RECESSED BOTTOM-ELECTRODE CAPACITORS AND METHODS OF ASSEMBLING SAME

摘要

A capacitor-over-bitline structure includes a bottom electrode that has an open vessel form factor. The bottom-electrode form factor includes a floor, rectilinear sidewalls, and a rim that defines the topmost feature. A capacitor dielectric film contacts and covers the floor, the sidewalls, and the rim. A top electrode has a convex form factor that complements the concave bottom-electrode form factor. A process of forming the capacitor-over-bitline structure by spinning on a reflowable sacrificial material such as an oxide that covers both logic and memory portions of a semiconductive device, followed by a polish-back process and a recessing etch of the bottom electrode.