发明名称 METHODS AND APPARATUS FOR CLOSED-LOOP FEEDBACK CONTROL OF PRINTING OF MULTILAYER PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide apparatus and methods for closed-loop control utilized in printing a multilayer pattern on a substrate. <P>SOLUTION: In one embodiment, a solar cell formation process is provided. The process comprises positioning a substrate on a substrate receiving surface of a printing station, printing a first patterned layer on a region of the substrate, acquiring a first image of the first patterned layer, storing the first optical image in a buffer, and printing a second patterned layer over the region of the substrate, where the second patterned layer is aligned over the region of the substrate using information received from the acquired first optical image. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013093578(A) 申请公布日期 2013.05.16
申请号 JP20120234093 申请日期 2012.10.23
申请人 APPLIED MATERIALS ITALIA S R L 发明人 GIORGIO CELLERE;BOSCOLO MARCHE ENRICO;ALESSANDRO VOLTAN;ALBERTO VILLALTA;LUIGI DE SANTI;TOMMASO VERCESI;MARCO GALIAZZO
分类号 H01L31/04 主分类号 H01L31/04
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