发明名称 |
Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods |
摘要 |
An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object. |
申请公布号 |
US8441610(B2) |
申请公布日期 |
2013.05.14 |
申请号 |
US201113084372 |
申请日期 |
2011.04.11 |
申请人 |
VAN DER HAM RONALD;VAN EMPEL TJARKO ADRIAAN RUDOLF;VOGEL HERMAN;ROSET NIEK JACOBUS JOHANNES;ASML NETHERLANDS B.V. |
发明人 |
VAN DER HAM RONALD;VAN EMPEL TJARKO ADRIAAN RUDOLF;VOGEL HERMAN;ROSET NIEK JACOBUS JOHANNES |
分类号 |
F03B11/02;F15B13/00;F16L3/01;G03B27/32;G03B27/42;G03B27/52 |
主分类号 |
F03B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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