发明名称 |
GAS BARRIER FILM, PROCESS FOR PRODUCTION OF GAS BARRIER FILM, AND ELECTRONIC DEVICE |
摘要 |
The present invention provides a gas barrier film having high barrier properties, folding/bending resistance and smoothness and excellent cutting suitability, and also provides an organic photoelectric conversion element equipped with the gas barrier film. The gas barrier film is characterized by having a gas barrier layer unit (5) on a side face of at least one surface of a base material (2), wherein the gas barrier layer unit (5) comprises a first barrier layer (3) formed by a chemical vapor deposition method and a second barrier layer (4) formed by applying a silicon compound onto the first barrier layer (3) to form a coating film and modifying the coating film, and wherein the second barrier layer (4) has an unmodified region (4B) on a side facing the base material and a modified region (4A) on a side facing the front layer of the film.
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申请公布号 |
US2013115423(A1) |
申请公布日期 |
2013.05.09 |
申请号 |
US201113810544 |
申请日期 |
2011.07.07 |
申请人 |
II HIROMOTO;ITO SATOSHI;HONDA MAKOTO;OISHI KIYOSHI;SUZUKI ISSEI;KONICA MINOLTA HOLDINGS, INC. |
发明人 |
II HIROMOTO;ITO SATOSHI;HONDA MAKOTO;OISHI KIYOSHI;SUZUKI ISSEI |
分类号 |
C09D1/00;B05D5/00 |
主分类号 |
C09D1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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