| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve uniformity of a resist residual film after development processing within a substrate surface and to suppress unevenness in line width and pitch of wiring patterns. <P>SOLUTION: A local exposure device comprises: substrate transport means 20; a chamber 8 forming an exposure processing space for a substrate G to be processed; a light source 4 comprising a plurality of light emitting elements L arranged in a line shape in a direction crossing with a substrate transport direction, capable for emitting light by light emission of the light emitting elements to a photosensitive film on the substrate to be processed being transported below; a light emitting drive part 9 capable of selectively performing light emission drive of one or a plurality of light emitting elements, as a light emitting control unit, among the plurality of light emitting elements constituting the light source; substrate detecting means 30 for detecting the substrate to be processed being transported by the substrate transport means; and a control part 40 supplied with substrate detection signals by the substrate detecting means and controlling drive of the light emitting elements by the light emitting drive part. <P>COPYRIGHT: (C)2013,JPO&INPIT |
