Illumination optics of optical system used in scanner for performing microlithography, has lighting channels whose total intensity in region of optical field is adapted by tilting specific number of individual mirrors to preset value

摘要

The illumination optics (4) has individual mirrors (26) of field facet (38) that are arranged between two tilting positions. The reflected lighting radiation of mirrors in a primary tilting position is contributed to lighting radiation of lighting channel in object field (5). The reflected lighting radiation of mirrors in a secondary tilting position is not contributed to lighting radiation of lighting channel in object field. The total intensity of lighting channels in region of optical field is adjusted by tilting specific number of mirrors to preset value. Independent claims are included for the following: (1) a method for illuminating object field; and (2) a method for manufacturing micro and nano structure component.