发明名称 IMPRINT APPARATUS, IMPRINT METHOD, IMPRINT SYSTEM, AND DEVICE MANUFACTURING METHOD
摘要 <p>PURPOSE: An imprint device, an imprinting method, an imprinting system, and a method for manufacturing the device are provided to prevent a substrate from forming using a damaged mold and to minimize the number of the substrates reduced for maintenance and repair. CONSTITUTION: An imprint device(100) comprises a radiating unit, a detecting unit(200), and a mold maintaining unit(130). The radiating unit radiates excitation light for irradiating a luminescent material. The mold maintaining unit is formed to maintain a mold including the luminescent material. A pattern is transferred to an imprint material, the radiating unit radiates the excitation light to the pattern. The detecting unit detects the light radiated from the luminescent material remains in the imprint material.</p>
申请公布号 KR20130046373(A) 申请公布日期 2013.05.07
申请号 KR20120119487 申请日期 2012.10.26
申请人 CANON KABUSHIKI KAISHA 发明人 IIMURA AKIKO;SUZUKI AKIYOSHI
分类号 B29C59/02;B29C33/42;B29C43/50;H01L21/027 主分类号 B29C59/02
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