发明名称 |
ROTARY DEPOSITION APPARATUS |
摘要 |
PURPOSE: A rotary deposition apparatus is provided to improve the uniformity of a thin film by rotating a substrate or the nozzle part of a deposition source. CONSTITUTION: A substrate holding part(33) fixes a substrate. A first rotation part(36) is connected to the substrate holding part and includes a first driving part and a first shaft. A deposition source(39) evaporates a deposition material stored in a crucible and discharges it to the substrate via a mask. A second rotation unit(43) includes a second driving part(41) and a second shaft(42). A driving part rotates a nozzle part(38) having nozzles connected to the evaporation source.
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申请公布号 |
KR20130045432(A) |
申请公布日期 |
2013.05.06 |
申请号 |
KR20110109618 |
申请日期 |
2011.10.26 |
申请人 |
TOP ENGINEERING CO., LTD. |
发明人 |
MA, HO YOUL;LEE, JAE UK |
分类号 |
H01L51/56;C23C14/24 |
主分类号 |
H01L51/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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