发明名称 ROTARY DEPOSITION APPARATUS
摘要 PURPOSE: A rotary deposition apparatus is provided to improve the uniformity of a thin film by rotating a substrate or the nozzle part of a deposition source. CONSTITUTION: A substrate holding part(33) fixes a substrate. A first rotation part(36) is connected to the substrate holding part and includes a first driving part and a first shaft. A deposition source(39) evaporates a deposition material stored in a crucible and discharges it to the substrate via a mask. A second rotation unit(43) includes a second driving part(41) and a second shaft(42). A driving part rotates a nozzle part(38) having nozzles connected to the evaporation source.
申请公布号 KR20130045432(A) 申请公布日期 2013.05.06
申请号 KR20110109618 申请日期 2011.10.26
申请人 TOP ENGINEERING CO., LTD. 发明人 MA, HO YOUL;LEE, JAE UK
分类号 H01L51/56;C23C14/24 主分类号 H01L51/56
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