| 摘要 |
PURPOSE: An antistatic photomask is provided to prevent damages on the photomask in a light exposure step by removing fundamental causes of static electricity generation, thereby being capable of forming precise patterns. CONSTITUTION: An antistatic photomask comprises a glass substrate(10), a light-shielding film consisting of a non-light permeable material and a transparent conducting film(20). The transparent conducting film is formed between the glass substrate and a light-shielding film. The transparent conducting film is an indium tin oxide thin film. A manufacturing method of the antistatic photomask comprises a step of forming the transparent conducting film on the glass substrate; a step of forming a light-shielding film on the transparent conducting film; and a step of forming a photoresist film(40) on the light-shielding film. |
