发明名称 METHODS OF FORMING PATTERNS ON A SUBSTRATE
摘要 A method of forming patterns on a substrate, the method including: placing a mask having an opening defining a portion of one surface of a substrate on which patterns are to be formed on the substrate; forming a first modification layer in the opening by ejecting a surface modification ink onto a surface of the substrate through the opening; ejecting a target ink having droplets of sizes larger than those of a surface modification ink such that the target ink is distributed on the first modification layer in the opening; and removing the mask.
申请公布号 US2013106942(A1) 申请公布日期 2013.05.02
申请号 US201213448438 申请日期 2012.04.17
申请人 KIM JOONG-HYUK;KANG SUNG-GYU;LEE SEUNG-HO;CHUNG JAE-WOO;HONG YOUNG-KI;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM JOONG-HYUK;KANG SUNG-GYU;LEE SEUNG-HO;CHUNG JAE-WOO;HONG YOUNG-KI
分类号 B41J2/015 主分类号 B41J2/015
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