发明名称 |
METHODS OF FORMING PATTERNS ON A SUBSTRATE |
摘要 |
A method of forming patterns on a substrate, the method including: placing a mask having an opening defining a portion of one surface of a substrate on which patterns are to be formed on the substrate; forming a first modification layer in the opening by ejecting a surface modification ink onto a surface of the substrate through the opening; ejecting a target ink having droplets of sizes larger than those of a surface modification ink such that the target ink is distributed on the first modification layer in the opening; and removing the mask.
|
申请公布号 |
US2013106942(A1) |
申请公布日期 |
2013.05.02 |
申请号 |
US201213448438 |
申请日期 |
2012.04.17 |
申请人 |
KIM JOONG-HYUK;KANG SUNG-GYU;LEE SEUNG-HO;CHUNG JAE-WOO;HONG YOUNG-KI;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM JOONG-HYUK;KANG SUNG-GYU;LEE SEUNG-HO;CHUNG JAE-WOO;HONG YOUNG-KI |
分类号 |
B41J2/015 |
主分类号 |
B41J2/015 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|