ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having effect in improvement of tapered profile of a resist pattern and capable of forming a pattern with good LER performance, and to provide a pattern forming method using the composition.

SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition comprise: (A) resin in which solubility in an alkali developer by action of acid increases; and (B) a compound generating the acid by irradiation with an actinic ray or radiation. The actinic ray-sensitive or radiation-sensitive resin composition contains 10 to 30 mass% of (B) the compound generating the acid by the irradiation with the actinic ray or radiation on the basis of entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition.

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