| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novolac phenol resin having both excellent heat resistance and good sensitivity, and capable of being used for a resin composition for photoresist; and to provide a photoresist resin composition using the same. <P>SOLUTION: The novolac phenol resin is obtained by reacting phenols, trimethylphenols and formaldehyde in the presence of an acidic catalyst, wherein the phenols contain metacresol; the metacresol is contained in 75 to 99 wt.% of the whole resin; the trimethylphenols are contained in 1 to 25 wt.% thereof; the novolac phenol resin has a weight-average molecular weight in terms of polystyrene of 15,000 to 45,000, and a binuclear component proportion of ≥4.0%. <P>COPYRIGHT: (C)2013,JPO&INPIT |
