发明名称 Photosensitive Resin Composition
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition containing a leveling agent for a photosensitive resin composition, the agent having excellent compatibility with a solvent for a photosensitive resin composition, high ability of reducing surface tension and of smoothening a surface, and high safeness. SOLUTION: This composition contains a (poly)glycerin-modified silicone having a structural unit (A) expressed by formula (1) which is an organopolysiloxane residue and a structural unit (B) expressed by formula (2) which is a (poly)glycerin derivative residue, bonded to produce a structure of A-B-A, by 0.01 to 20 wt.%. In formula (1), R<SP>1</SP>independently represents a 1-10C alkyl group, cycloalkyl group, aryl group or aralkyl group which may be substituted with a halogen atom, x is an integer of 0 to 100,αis 1 or 2; and in formula (2), R<SP>2</SP>independently represents a 2-10C alkylene group and s is an integer of 1 to 11. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 KR101258704(B1) 申请公布日期 2013.04.26
申请号 KR20060025991 申请日期 2006.03.22
申请人 发明人
分类号 C08G77/38;G03F7/075 主分类号 C08G77/38
代理机构 代理人
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