发明名称 LAMINATE STRUCTURE INCLUDING OXIDE SEMICONDUCTOR THIN FILM LAYER, AND THIN FILM TRANSISTOR
摘要 A stacked layer structure including an oxide layer and an insulating layer, the oxide layer having a carrier concentration of 10 18 /cm 3 or less and an average crystal diameter of 1 µm or more; and the crystals of the oxide layer being arranged in a columnar shape on the surface of the insulating layer.
申请公布号 KR101258802(B1) 申请公布日期 2013.04.26
申请号 KR20127028849 申请日期 2011.12.27
申请人 发明人
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
代理机构 代理人
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