发明名称 |
METHOD FOR PRODUCING CHLOROPOLYSILANE, AND DEVICE FOR PRODUCING CHLOROPOLYSILANE |
摘要 |
<p>The purpose of the present invention is to provide a method for producing a chloropolysilane having an excellent yield of disilicon hexachloride. A method for producing chloropolysilane, the method involving reacting fluidized silicon particles or silicon alloy particles with a chlorine gas, wherein the chlorine gas is injected where the moving speed of the fluidized silicon particles or the silicon alloy particles is 5 mm/sec or faster. At this time, it is preferred that the chlorine gas is injected in a range from the particle surfaces of the fluidized silicon particles or the silicon alloy particles to a depth of 500 mm. Moreover, it is preferred that the chlorine gas is injected such that the injection location, to which the chlorine gas is injected, is divided into multiple areas relative to the entire range in which the silicon particles or the silicon alloy particles flow and the amount of chlorine gas injected is in the range of 1 to 500L/h for each injection location.</p> |
申请公布号 |
WO2013057996(A1) |
申请公布日期 |
2013.04.25 |
申请号 |
WO2012JP68945 |
申请日期 |
2012.07.26 |
申请人 |
TOAGOSEI CO., LTD.;MORITA, MASATOSHI;KANIE, TATSUYA;TAGUCHI, HIROMU;TAKASHIMA, KANEMASA |
发明人 |
MORITA, MASATOSHI;KANIE, TATSUYA;TAGUCHI, HIROMU;TAKASHIMA, KANEMASA |
分类号 |
C01B33/107 |
主分类号 |
C01B33/107 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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