发明名称 REPLACEMENT GATE MULTIGATE TRANSISTOR FOR EMBEDDED DRAM
摘要 A memory cell, an array of memory cells, and a method for fabricating a memory cell with multigate transistors such as fully depleted finFET or nano-wire transistors in embedded DRAM. The memory cell includes a trench capacitor, a non-planar transistor, and a self-aligned silicide interconnect electrically coupling the trench capacitor to the non-planar transistor.
申请公布号 WO2013059010(A1) 申请公布日期 2013.04.25
申请号 WO2012US59154 申请日期 2012.10.06
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;CHANG, JOSEPHINE, B;CHANG, LELAND;GUILLORN, MICHAEL, A.;HAENSCH, WILFRIED, E. 发明人 CHANG, JOSEPHINE, B;CHANG, LELAND;GUILLORN, MICHAEL, A.;HAENSCH, WILFRIED, E.
分类号 H01L21/82 主分类号 H01L21/82
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