摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist protective film material that has high water-repellent and highly water-sliding properties, causes few development defect,and achieves a satisfactory resist pattern after development, a resist protective film material for immersion lithography in particular, and a pattern formation method using the material. <P>SOLUTION: The resist protective film material contains a polymer compound comprising a repeat unit represented by the general formula (1) and having weight-average molecular weight between 1,000 and 500,000. (In the formula, R<SP POS="POST">4</SP>to R<SP POS="POST">6</SP>represent a fluorinated monovalent hydrocarbon group.) The present invention provides a resist protective film material having a repeat unit containing a highly water-repellent and highly water-sliding fluorine-containing cyclic acetal. <P>COPYRIGHT: (C)2013,JPO&INPIT |