| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a resist pattern having dimensions different from the pattern dimensions of a mold by a desired ratio in nanoimprint under some standard conditions. <P>SOLUTION: In a nanoimprint method, a resist 6 is hardened in a state where the pressure P in a pressure vessel 110 and/or the temperature of an assembly 8 are controlled so as to satisfy predetermined relational expressions on the basis of the ratio ΔD<SB POS="POST">all</SB>of dimensional difference of the resist pattern to reference dimensions, reference pressure P<SB POS="POST">st</SB>, reference temperature T<SB POS="POST">st</SB>, and Young's modulus E<SB POS="POST">m</SB>and coefficient of thermal expansion α<SB POS="POST">i</SB>of the mold, by using a mold 1 with a fine uneven pattern having predetermined reference dimensions at a predetermined reference pressure Pst and a predetermined reference temperature Tst being formed on the surface, and a processed substrate 7 where the Young's modulus and/or the coefficient of thermal expansion are different from each other. <P>COPYRIGHT: (C)2013,JPO&INPIT |
