| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition containing β-hydroxyalkyl amide soluble with an organic solvent, from which a film or a fine pattern satisfying heat-resistance, chemical resistance, smoothness, and optical characteristics can be formed. <P>SOLUTION: A photosensitive composition containing: a β-hydroxyalkyl amide (A) having specific structure; a polymer (B) containing a carboxyl group; and a photopolymerization initiator (C), essentially contains a photopolymerizable functional group in the composition. Furthermore, in the photosensitive composition, the β-hydroxyalkyl amide (A) is soluble with an organic solvent. A coating agent for an interlayer insulating film of a touch panel, a photosensitive composition for a color filter, and a photosensitive solder resist ink are provided, which comprises the photosensitive composition. <P>COPYRIGHT: (C)2013,JPO&INPIT |
