发明名称 |
Film-forming apparatus |
摘要 |
In a film-forming apparatus in which two or more gases are used, a uniform film is formed. In a film-forming apparatus provided with a film-forming chamber and a shower head, the shower head is provided with a material gas diffusion chamber and a reactive gas diffusion chamber. A gas passage which communicates the material gas diffusion chamber and a material gas introduction pipe is constituted into multi-stages of one stage or more. Each stage has a gas passage represented by 2n-1 (where n is the number of stages). The first-stage gas passage has connected to the center thereof the material gas introduction pipe. Each of second-stage and subsequent-stage gas passages has connected to the center thereof connection holes which are provided on both ends of the previous-stage gas passages so as to be in communication with the previous-stage gas passages. Each of the final-stage gas passages is connected to the material gas diffusion chamber by connection holes formed on both ends of each of the gas passages. |
申请公布号 |
US8419854(B2) |
申请公布日期 |
2013.04.16 |
申请号 |
US20080450265 |
申请日期 |
2008.04.15 |
申请人 |
HATANAKA MASANOBU;IRINO OSAMU;ISHIKAWA MICHIO;ULVAC, INC. |
发明人 |
HATANAKA MASANOBU;IRINO OSAMU;ISHIKAWA MICHIO |
分类号 |
C23C16/455;C23C16/06;C23C16/22;C23C16/511;C23F1/00;H01L21/306 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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