| 摘要 |
A method of exposing a substrate to a pattern using an exposure apparatus. The method includes performing an update of a parameter, necessary for processing in the exposure apparatus, through measurement, in which the measurement is performed for each update of the parameter, setting a validity period for the updated parameter, in which the validity period represents a period in which the updated parameter is valid for the processing, predicting a completion time for a next exposure processing segment to be performed by the exposure apparatus, determining whether the predicted completion time is after expiration of the validity period, in which the setting of the validity period is performed after the performing of the update and before the determining step, and causing the update of the parameter to be performed if it is determined in the determining step that the predicted completion time is after the expiration of the validity period. |
