| 摘要 |
PURPOSE: A coating method and a coating apparatus are provided to reduce the difference between the thickness of a coated film at central part of a substrate and the thickness of the coated film at peripheral part of the substrate by moving coating solution within the coated film, thereby making the thickness of the coated film be nearly uniform on the overall substrate. CONSTITUTION: A coating method comprises a process of forming a coated film, which is thicker at the central part of a substrate than at the peripheral part of the substrate, by discharging droplets of a coating solution through multiple nozzles installed at an inkjet head; and a process of moving the coating solution within the coated film from the central part of the substrate to the peripheral part of the substrate by rotating the substrate. A coating apparatus comprises a rotation support(1) to rotatably support the substrate; an inkjet head(11) having multiple nozzles to discharge droplets of the coating solution; a relative movement mechanism to move the inkjet head and the substrate relatively; and a control unit(41) to move the coating solution within the coated film from the central part of the substrate to the peripheral part of the substrate. [Reference numerals] (15) Resist source; (21) Head moving device; (35) Solution source; (41) Control unit; |
