DEVICE AND METHOD OF LEAK FLUID OF SUBSTRATE CLEANING APPARATUS, AND SUBSTRATE CLEANING APPARATUS AND METHOD HAVING THE SAME

摘要

PURPOSE: A device and a method for collecting the leak fluid of a substrate cleaning apparatus, and the substrate cleaning apparatus and a method thereof are provided to rapidly collect the leak fluid used in a substrate cleaning process by using a suction method and to reduce cleaning time. CONSTITUTION: A cleaning nozzle(230) supplies a cleaning solution onto a substrate(210) mounted on a stage(212). A suction nozzle(240) is provided to the lateral part of the stage. A leak fluid flowing out from the edge part(E1) of the substrate or the outer circumference(C) of the stage is absorbed by a suction nozzle using a suction method. An air suction device(250) is connected to the suction nozzle.