发明名称 |
Material Delivery System and Method |
摘要 |
A system and method for controlling saturated vapor pressure of a precursor material is provided. An embodiment comprises generating a calibration curve and utilizing the calibration curve to control a temperature of the precursor material in order to control its saturated vapor pressure. Alternatively, the calibration curve may be substituted for a real time sensor which can take readings in real time and adjust the temperature and saturated vapor pressure based upon the real time readings.
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申请公布号 |
US2013089934(A1) |
申请公布日期 |
2013.04.11 |
申请号 |
US201113269372 |
申请日期 |
2011.10.07 |
申请人 |
LIU KE-CHIH;TSAI CHIA-MING;CHEN YEN-YU;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIU KE-CHIH;TSAI CHIA-MING;CHEN YEN-YU |
分类号 |
H01L21/66;C23C16/448;C23C16/52;C23F1/08 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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