发明名称 Material Delivery System and Method
摘要 A system and method for controlling saturated vapor pressure of a precursor material is provided. An embodiment comprises generating a calibration curve and utilizing the calibration curve to control a temperature of the precursor material in order to control its saturated vapor pressure. Alternatively, the calibration curve may be substituted for a real time sensor which can take readings in real time and adjust the temperature and saturated vapor pressure based upon the real time readings.
申请公布号 US2013089934(A1) 申请公布日期 2013.04.11
申请号 US201113269372 申请日期 2011.10.07
申请人 LIU KE-CHIH;TSAI CHIA-MING;CHEN YEN-YU;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LIU KE-CHIH;TSAI CHIA-MING;CHEN YEN-YU
分类号 H01L21/66;C23C16/448;C23C16/52;C23F1/08 主分类号 H01L21/66
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