| 摘要 |
<p>The present invention involves a photoresist composition containing (A) a polymer having a structural unit (I) represented by formula (1), and (B) an acid-generating body, wherein the Van der Waals volume of the acid generated from the acid-generating body (B) is not less than 2.1 × 10-28m3. In formula (1): R1 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R2 and R3 are, independently, each a hydrogen atom, a fluorine atom, a hydroxy group or a monovalent organic group with one to twenty carbons, or R2 and R3 are combined with each other to represent a ring structure with three to twenty carbons constituted in conjunction with a carbon atom to which R2 and R3 are bonded; and R4 and R5 are, independently, each a hydrogen atom or a monovalent organic group with one to twenty carbons, or R4 and R5 are combined with each other to represent a ring structure with three to twenty carbons constituted in conjunction with a carbon atom to which R4 and R5 are bonded. n is an integer from one to four.</p> |
