FILM FORMING METHOD AND FILM FORMING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a film forming method capable of easily forming a good-quality film, and a film forming device.

SOLUTION: A film forming method of an embodiment comprises: a first step of supplying an organic silicon compound including at least one organic functional group and one functional group which causes hydrolysis to a surface of a substrate under an air atmosphere; and a second step of oxidizing the organic functional group after supplying the organic silicon compound to the surface of the substrate to form a layer including silicon and oxygen on the surface of the substrate.

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