| 摘要 |
<p>The present invention is a photoresist composition containing the following: a polymer (A) that has a constitutional unit (I) represented by diagram (1); and an acid generator (B). In diagram (1), R1, R2, R4, and R6 each independently represent a hydrogen atom, a fluorine atom, a hydroxy group, or a C1-20 monovalent organic group; either R3 and R5 each independently represent a hydrogen atom, a fluorine atom, a hydroxy group, or a C1-20 monovalent organic group or R3 and R5 are combined and, together with the carbon atoms bound thereto, represent a C3-10 cyclic group; and R7 represents a hydrogen atom or a methyl group.</p> |
