发明名称 |
MASK SURFACE ROUGHNESS MEASURING METHOD AND MEASURING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To quickly measure surface roughness of a desired region of a blank mask without causing occurrence of a measured value error resulted from a defect of the blank mask or the like. <P>SOLUTION: A mask surface roughness measuring method for measuring surface roughness of a blank mask for manufacturing an exposure mask includes: a first step of causing measurement light to be made incident to the blank mask and of acquiring a dark field image of any region on the blank mask by using an optical system for acquiring the dark field image by the blank mask; a second step of obtaining the surface roughness by using image intensity of a peripheral region of a point of interest and a relational expression set beforehand in a case where the image intensity of the dark field image in the point of interest in any region is less than a threshold value set beforehand; a third step of averaging the surface roughness obtained by repeating the second step in all points of any region; and a fourth step of outputting a mean value obtained in the third step as the surface roughness of any region. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013061239(A) |
申请公布日期 |
2013.04.04 |
申请号 |
JP20110199809 |
申请日期 |
2011.09.13 |
申请人 |
TOSHIBA CORP;RENESAS ELECTRONICS CORP |
发明人 |
YAMANE TAKESHI;TERASAWA TSUNEO |
分类号 |
G01B11/30;G03F1/22;G03F1/84;H01L21/027 |
主分类号 |
G01B11/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|