发明名称 MASK SURFACE ROUGHNESS MEASURING METHOD AND MEASURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To quickly measure surface roughness of a desired region of a blank mask without causing occurrence of a measured value error resulted from a defect of the blank mask or the like. <P>SOLUTION: A mask surface roughness measuring method for measuring surface roughness of a blank mask for manufacturing an exposure mask includes: a first step of causing measurement light to be made incident to the blank mask and of acquiring a dark field image of any region on the blank mask by using an optical system for acquiring the dark field image by the blank mask; a second step of obtaining the surface roughness by using image intensity of a peripheral region of a point of interest and a relational expression set beforehand in a case where the image intensity of the dark field image in the point of interest in any region is less than a threshold value set beforehand; a third step of averaging the surface roughness obtained by repeating the second step in all points of any region; and a fourth step of outputting a mean value obtained in the third step as the surface roughness of any region. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013061239(A) 申请公布日期 2013.04.04
申请号 JP20110199809 申请日期 2011.09.13
申请人 TOSHIBA CORP;RENESAS ELECTRONICS CORP 发明人 YAMANE TAKESHI;TERASAWA TSUNEO
分类号 G01B11/30;G03F1/22;G03F1/84;H01L21/027 主分类号 G01B11/30
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