发明名称 METHOD TO FORM SOLDER ALLOY DEPOSITS ON SUBSTRATES
摘要 Method of forming a solder alloy deposit on a substrate comprising i) provide a substrate including a surface bearing electrical circuitry that includes at least one inner layer contact area, ii) form a solder mask layer on the substrate surface and patterned to expose at least one contact area, iii) contact the entire substrate area including the solder mask layer and the at least one contact area with a solution to provide a metal seed layer on the substrate surface, iv) form a structured resist layer on the metal seed layer, v) electroplate a first solder material layer containing tin onto the conductive layer, vi) electroplate a second solder material layer onto the first solder material layer, vii) remove the structured resist layer and etch away an amount of the metal seed layer sufficient to remove the metal seed layer from the solder mask layer area and reflow the substrate.
申请公布号 US2013082091(A1) 申请公布日期 2013.04.04
申请号 US201113701499 申请日期 2011.06.23
申请人 MATEJAT KAI-JENS;LAMPRECHT SVEN;EWERT INGO;ATOTECH DEUTSCHLAND GMBH 发明人 MATEJAT KAI-JENS;LAMPRECHT SVEN;EWERT INGO
分类号 B23K31/02 主分类号 B23K31/02
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