发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE |
摘要 |
Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. |
申请公布号 |
WO2013047911(A1) |
申请公布日期 |
2013.04.04 |
申请号 |
WO2012JP75880 |
申请日期 |
2012.09.28 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
ITO, JUNICHI;SHIBUYA, AKINORI;MATSUDA, TOMOKI;TOKUGAWA, YOKO;FUKUHARA, TOSHIAKI;TANGO, NAOHIRO;IWATO, KAORU;YOSHIDOME, MASAHIRO;SUGIYAMA, SHINICHI;KATAOKA, SHOHEI |
分类号 |
G03F7/004;C07C381/12;C07D327/08;C07D333/76;G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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