TREATING APPARATUS FOR A SUBSTRATE AND TREATING METHOD FOR THE SUBSTRATE

摘要

PURPOSE: An apparatus and a method for treating a substrate are provided to perform various processes in one chamber. CONSTITUTION: A main body(10) including a plurality of working surfaces(12) rotates in a horizontal direction. A plurality of fixing units(20) installed at each work surface fixes a substrate(50). A process unit(30) faces a work surface. The process unit processes one surface of the substrate. A loading/unloading unit(40) includes a robot for transferring the substrate.