<p>PURPOSE: A thin film transistor is provided to improve electron mobility by using a first semiconductor layer including indium oxide and a second semiconductor layer including tin oxide. CONSTITUTION: A gate electrode(200) is formed on a substrate(100). A gate insulating layer(300) is formed on the gate electrode. A channel layer(400) is formed on the gate insulating layer. The channel layer includes a first semiconductor layer(410) and a second semiconductor layer(420). A source electrode(510) and a drain electrode(520) electrically touch a part of the channel layer.</p>
申请公布号
KR20130029272(A)
申请公布日期
2013.03.22
申请号
KR20110092600
申请日期
2011.09.14
申请人
SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
发明人
HAN, JIN WOO;YU, TAE HWAN;CHO, JO HANN;LEE, SEUNG JU