发明名称 MANUFACTURING METHOD OF IMAGING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an imaging apparatus for highly precisely adjusting positioning of a substrate which holds an imaging element to an imaging lens system held by a lens holding frame member. <P>SOLUTION: A positioning adjusting apparatus includes a pair of chucking sections 15 and 16 which hold confronted end faces (notches 5a and 5b) on both sides in a substrate 5 so that they are sandwiched and which are formed of flat sections 15a and 16a and taper face sections 15b and 16b. The substrate 5 includes a slope face 5c that is obliquely cut so that a tip of the end face becomes an acute angle to a thickness direction in at least one notch 5a sandwiched between the chucking sections 15 and 16. When the end faces (notches 5a and 5b) on both sides of the substrate 5 are sandwiched by moving the pair of chucking sections 15 and 16 in a positioning adjusting process, the slope face 5c is brought into face-contact with the taper face section 15b and a flat face near the end face of the substrate 5 is brought into face-contact with the flat section 15a. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013055539(A) 申请公布日期 2013.03.21
申请号 JP20110192871 申请日期 2011.09.05
申请人 RICOH CO LTD 发明人 TANAKA CHIHIRO
分类号 H04N5/225;G02B7/02;G03B17/02;H04N5/232 主分类号 H04N5/225
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