发明名称 Dual beam system
摘要 A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.
申请公布号 US8399864(B2) 申请公布日期 2013.03.19
申请号 US201113222536 申请日期 2011.08.31
申请人 HILL RAYMOND;SCIPIONI LAWRENCE;SANFORD COLIN AUGUST;DIMANNA MARK;TANGUAY MICHAEL;FEI COMPANY 发明人 HILL RAYMOND;SCIPIONI LAWRENCE;SANFORD COLIN AUGUST;DIMANNA MARK;TANGUAY MICHAEL
分类号 H01J37/141;H01J37/26;H01J37/02;H01J37/08;H01J37/28;H01J37/30 主分类号 H01J37/141
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