REFLECTIVE MASK BLANK, METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK AND METHOD FOR QUALITY CONTROL FOR REFLECTIVE MASK BLANK

摘要

The present invention provides a reflective mask blank having in the order listed a substrate, a multilayer reflective film for reflecting exposure light, and an absorption layer for absorbing said exposure light. The reflective mask blank also has a reference mark for indicating a reference position for said multilayer reflective film, which is formed as a recess in or a projection from the surface of said multilayer reflective film or the surface of one layer formed between said multilayer reflective film and said absorption layer. Said reference mark is formed so that the reflectance thereof is different from the reflectance in the area surrounding the reference mark with respect to light with a prescribed wavelength, and is transferred to a layer film-formed on said reference mark.