| 摘要 |
<p>An exposure apparatus exposes a substrate (P) to exposure light- through liquid (LQ). The exposure apparatus includes: a first member (30) which is disposed in at least a portion of the periphery of a light path (K) of the exposure light, and has a first surface (31) that faces an upper surface of an object (P) via a first gap (W1) interposed therebetween and holds the liquid (LQ) between the upper surface of the object and the first surface; a second member (60) which is disposed at the outside of the first surface with respect to the light path, and has a second surface (61) that faces the upper surface of the object via a second gap (W2) interposed therebetween; and a suction port (33) which is disposed between the first surface (31) and the second surface (61), and suctions at least a portion of gas (Ga) in a space located outside the second member with respect to the light path, through the second gap (W2). The size of the second gap (W2) is smaller than the size of the first gap (W1).</p> |
