发明名称 ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM IRRADIATION SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To flatten dose distribution of electron beams. <P>SOLUTION: An electron gun 110 of an electron beam irradiation apparatus 100 emits electron beams EB, an accelerator 118 accelerates the electron beams emitted from the electron gun, and a scan horn 120 controls an irradiation direction of the electron beams accelerated by the accelerator. Furthermore, the scan horn performs at least unidirectional scan processing on an object W to be irradiated and in a turn of the scan processing, irradiation with electron beams is stagnated for a predetermined time. Therefore, dose distribution of electron beams can be flattened by uniformly irradiating the object to be irradiated with electron beams while complementing dose lack at a terminal part of the object to be irradiated in a width direction. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013047616(A) 申请公布日期 2013.03.07
申请号 JP20110185507 申请日期 2011.08.29
申请人 IHI CORP 发明人 MATSUO KENICHI;YAMANAKA YOSUKE
分类号 G21K5/04;G21K5/10 主分类号 G21K5/04
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