发明名称 IMPROVEMENTS IN OR RELATING TO PROCESSES FOR THE REDUCTION OF ELECTRIC CONTACT RESISTANCE
摘要 1,237,481. Printed circuits. SIEMENS A.G. 26 Aug., 1969 [27 Aug., 1968], No. 42338/69. Heading H1R. [Also in Divisions C7 and H2] In an integrated circuit &c. having conductive strips formed by vaporization, cathode sputtering, chemical deposition, or electroplating, the contact resistance between superposed conductive strips is reduced by applying electrical energy from a charged capacitor to the junction. The invention is particularly applicable to A1 conductive strips, and the contact resistance may be caused by oxidation, varnish or other foreign matter or absorbed gases, or may result from incidental chemical processes. Preferably the P.D. between the plates of the charged capacitor is between IV. and 20V. Embodiments described include bridging strips deposited over insulation to connect conductive strips on either side thereof, and link conductors which effect connections at cross-over points on a cross-bar matrix.
申请公布号 GB1237481(A) 申请公布日期 1971.06.30
申请号 GB19690042338 申请日期 1969.08.26
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人
分类号 H01L23/58;H01L49/02 主分类号 H01L23/58
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