发明名称 |
APPARATUS FOR PROCESSING LARGE AREA SUBSTRATE |
摘要 |
PURPOSE: An apparatus for processing a large area substrate is provided to improve process uniformity by using a through hole formed on a gas injection connection part. CONSTITUTION: A substrate mounting part is installed in a reaction chamber. A shower head(30) is installed at the upper part of the substrate mounting part. The shower head includes a gas supply hole for supplying reaction gas to a diffusion space. A gas box(40) is arranged in the upper part of the shower head. A gas injection connection part(60) is installed between the shower head and the gas box.
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申请公布号 |
KR20130021091(A) |
申请公布日期 |
2013.03.05 |
申请号 |
KR20110083400 |
申请日期 |
2011.08.22 |
申请人 |
TES CO., LTD. |
发明人 |
YOON, DAE GUEN;SHIN, KI JO |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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