发明名称 |
Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof |
摘要 |
Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
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申请公布号 |
US8389663(B2) |
申请公布日期 |
2013.03.05 |
申请号 |
US20090575515 |
申请日期 |
2009.10.08 |
申请人 |
BROCK PHILLIP JOE;LIN QINGHUANG;MILLER ROBERT DENNIS;NELSON ALSHAKIM;RATHORE JITENDRA SINGH;SOORIYAKUMARAN RATNAM;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BROCK PHILLIP JOE;LIN QINGHUANG;MILLER ROBERT DENNIS;NELSON ALSHAKIM;RATHORE JITENDRA SINGH;SOORIYAKUMARAN RATNAM |
分类号 |
C08G77/04 |
主分类号 |
C08G77/04 |
代理机构 |
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