| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve productivity by performing film formation uniformly at a time to a number of substrates even when film formation conditions are different. <P>SOLUTION: An AIP apparatus 101 includes: an evacuation unit for evacuating the inside of a vacuum chamber; four rotating holders 4 each holding, in a rotating state, a substrate on which a film is to be formed; a revolving table 5 for allowing the rotating holders 4 to revolve around the revolution axis Q that is parallel to the axial center of the rotation axis of each holder 4; an arc evaporation source 6; and a power supply unit 10B provided with four bias power supplies 10B1 to 10B4. Each of the rotating holders 4 is connected to a different bias power supply through a slip ring 151, and thereby, different film formation conditions are constituted by the difference of the bias potential. <P>COPYRIGHT: (C)2013,JPO&INPIT |
