| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate clamp system and a lithographic device capable of avoiding stress guided by particles and/or heat in a substrate and improving pattern transfer accuracy. <P>SOLUTION: A lithographic device configured so as to transfer a pattern from a patterning device to a substrate W includes: a substrate table configured so as to hold the substrate; a first clamp system 40, 128 configured so as to clamp the substrate table to a substrate table support structure; and a second clamp system 40, 129 configured so as to clamp the substrate to the substrate table after the substrate table is clamped to the substrate table support structure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
