| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive acid generator that can provide a photoresist composition excellent in an EL (Exposure Latitude), reducing LWR (Line Width Roughness) of a pattern obtained therefrom and improving lithographic characteristics. <P>SOLUTION: A compound expressed by formula (1) is provided. In formula (1), R<SP POS="POST">2</SP>preferably represents a 1-20C chain hydrocarbon group. Also a photoresist composition is provided, comprising [A] the compound and [B] a polymer having a structural unit (I) including an acid dissociable group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
