发明名称 Semiconductor device with vertical channel transistor
摘要 Provided is a semiconductor device having a vertical channel transistor and method of fabricating the same. The semiconductor device includes first and second field effect transistors, wherein a channel region of the first field effect transistor serves as source/drain electrodes of the second field effect transistor, and a channel region of the second field effect transistor serves as source/drain electrodes of the first field effect transistor.
申请公布号 US8384141(B2) 申请公布日期 2013.02.26
申请号 US201113097343 申请日期 2011.04.29
申请人 SAMSUNG ELECTRONICS CO., LTD.;KIM DAEIK;OH YONGCHUL;HWANG YOOSANG;CHUNG HYUN-WOO;CHO YOUNG-SEUNG 发明人 KIM DAEIK;OH YONGCHUL;HWANG YOOSANG;CHUNG HYUN-WOO;CHO YOUNG-SEUNG
分类号 H01L27/108;H01L21/336;H01L29/94 主分类号 H01L27/108
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