发明名称 METHOD FOR PROCESSING GLASS
摘要 PURPOSE: A glass manufacturing method is provided to have fissility and excellent resolution of photosensitive resin composition during etching process by using photosensitive resin composition containing alkali soluble resin with phenolic hydroxyl group. CONSTITUTION: A glass manufacturing method comprises the following steps. A coating film of a photosensitive resin composition is formed on a glass substrate. The coating film is selectively exposed. The coating film after the exposure is developed and forms a resin pattern. The resin pattern is set as a mask to etch the glass substrate. The resin pattern is peeled off. The photosensitive resin composition comprises an alkali soluble resin with phenoic -OH. The etching process uses 25-60 deg C of etching solution containing sulfuric acid and hydrofluoric acid. The photosensitive resin composition additionally contains polyvinyl alkyl ether as a plasticizer. The photosensitive resin composition additionally contains compound containing quinonediazide group.
申请公布号 KR20130018538(A) 申请公布日期 2013.02.25
申请号 KR20120081242 申请日期 2012.07.25
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 UEMATSU TERUHIRO
分类号 C03C15/00;G03F7/022;G03F7/032;G03F7/26 主分类号 C03C15/00
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