发明名称 METHOD FOR ANALYZING SEMICONDUCTOR SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method capable of simply obtaining a diffusion constant of minority carriers in a semiconductor substrate. <P>SOLUTION: A method for analyzing a semiconductor substrate includes: measuring a primary mode lifetime &tau;<SB POS="POST">1</SB><SP POS="POST">(1)</SP>(104) of a first semiconductor substrate of which a surface recombination speed of a first surface and a second surface have been adjusted to 2.8&times;10<SP POS="POST">4</SP>[cm/sec] or more, and a primary mode lifetime &tau;<SB POS="POST">1</SB><SP POS="POST">(2)</SP>(106) of a second semiconductor substrate of which a surface recombination speed of one surface of a first surface or a second surface has been adjusted to 2.8&times;10<SP POS="POST">4</SP>[cm/sec] or more, and the surface recombination speed of the other surface thereof has been adjusted to 10[cm/sec] or less, with a &mu;-PCD method; and substituting the obtained &tau;<SB POS="POST">1</SB><SP POS="POST">(1)</SP>, &tau;<SB POS="POST">1</SB><SP POS="POST">(2)</SP>and the thickness W of the semiconductor substrate into the following approximate expression to simply obtain a diffusion constant D of minority carriers in the semiconductor substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013038403(A) 申请公布日期 2013.02.21
申请号 JP20120152224 申请日期 2012.07.06
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 SHINOHARA SOJI
分类号 H01L21/66;G01N22/00 主分类号 H01L21/66
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