| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a probe for a micromachining device and the micromachining device to be used for extreme micromachining such as a machining correction of a photomask to be used for forming a semiconductor integrated circuit. Ž<P>SOLUTION: This probe is provided with a cantilever 22, a cantilever attitude maintaining mechanism 30, contact detecting mechanisms 10 provided in the cantilever 22 and the cantilever attitude maintaining mechanism 30, and a body part 23 for fixing a base end part of the cantilever 22 in a cantilever state so that a tip part may be a free end. At a tip of the cantilever 22, a sharpened probe part 21 is provided to be projected from the cantilever 22. Ž<P>COPYRIGHT: (C)2009,JPO&INPIT Ž</p> |
